烟草蚀纹病毒弱株系的选育及免疫效果研究

Induced Mild Strains of Tobacco Etch Virus

１９９１～１９９５年利用钴６０照射和亚硝酸处理进行了烟草蚀纹病毒（ＴＥＶ）弱株系的选择及防病效果试验。结果表明，钴６０照射病毒溶液能产生弱株突变体的适宜剂量是１．２９，２．５８Ｃ／ｋｇ，亚硝酸处理的适宜浓度和时间是１ｍｏｌ·Ｌ－１，３０～５０ｍｉｎ．经选择效果明显的弱株有Ｒ４和Ｈ３８，其室内交互保护试验的效果最高分别是８５．８％和４７．４％；田间防病效果分别为８１．６％和４０．３％．两个弱株免疫后接种强株，其烟株体内病毒含量均低于强株对照。试验还表明，亚硝酸处理较钴６０能产生较多的弱株突变体。

Mild strains of tobacco etch are studied.The suitable dosage of C 60 0 treatment is 1.29 C/kg and 2.58 C/kg for producing TEV mutant.The suitable density of HNO 2 treatment is 1 mol·L -1 30-50 min.R 4 strain and H 38 strain are better.The protection effect of R 4 and H 38 is 85.8% and 47.4% in greenhouse,respectively.The effect of R 4 to control tobacco etch virus is 81.6% in the field,whereas H 38 is 40.3%.The virus content of immune plant is lower than check.The results show that HNO 2 treatment can produce more mutants than C 60 0.