溶胶-凝胶法制备多孔SiO_2薄膜开裂问题研究进展

Research Progress in Cracking of Porous Silica Films Prepared by Sol-gel Process

综述了用溶胶-凝胶法制备多孔SiO_2薄膜过程中薄膜开裂问题的研究进展,讨论了影响薄膜开裂的各种因素。对各种可能导致开裂的因素如溶剂、化学添加剂、表面改性、干燥过程等进行了开裂原理分析,并给出了部分解决方法。

In this paper the researches on the cracking problem of porous SiO2 thin film prepared by the solgel method are summarized and various factors in the process which may lead to cracking are discussed. Several elements which may lead to cracking, such as solvent, DCCA, surface modifying, and the dryness procedure are analyzed. Some resolvents are presented in detail.