Bi_2Te_3基热电薄膜材料的制备方法研究

Research on Preparation Methods of Bi_2Te_3-based Thermoelectric Thin Films

Bi_2Te_3基热电材料由于在微电子、光电子等高技术领域具有潜在的应用前景,从而得到了人们的广泛关注。低维Bi_2Te_3基热电材料由于具有特殊的量子限制效应,已成为提高热电性能的有效途径。近年来,研究者非常重视Bi_2Te_3基热电薄膜的制备及性能研究,并做了大量相关的研究工作,许多制备方法也相继出现,并获得了高质量的Bi_2Te_3基热电薄膜。

Bi2Te3-based thermoelectric materials have attracted more and more attention for their potential application in microelectronics, optoelectronics and other high-tech fields. Low dimensional Bi2 Te3-based materials, which show special quantum confinement effect and transport properties, have been proved to be an effective route to improve thermoelectric properties. The preparation and thermoelectric properties of Bi2Te3-based thin films have got much attention by many researchers in recent years. Several new methods have been developed and employed to grow high quality Bi2Te3-based thermoelectric thin films.