直流磁控溅射制备纳米TiO_2薄膜研究

Study on Nano TiO_2 Films Deposited by DC Magnetron Sputtering

使用直流磁控溅射装置,通过在溅射过程中加入不同的金属网格,250℃条件下在玻璃衬底上制备了不同晶粒尺寸的TiO2薄膜。利用场发射扫描电子显微镜(SEM)、X射线衍射谱(XRD)对薄膜的表面形貌结构和进行了分析。研究结果表明:在磁控溅射过程中金属网格的引入能有效减小TiO2薄膜的晶粒尺寸,并且金属网格的网孔尺寸越小,晶粒尺寸越小。

The TiO2 films were prepared with different grain size on glass substrate by DC magnetron sputtering at the temperature of 250 ℃. The morphology and structure of the films were examined by Field Emission Scanning Electron Microscope （SEM） and X-ray diffraction （XRD）. The results show that the grain size could be reduced effectively by the grid in sputtering process and the smaller the mesh is, the smaller the size of grains will be.