摘要
在高功率激光装置中3倍频器高氘化的KD*P晶体相变温度是110℃。在SiO2溶胶合成阶段进行化学改性,将六甲基二硅氮烷(HMDS)加入SiO2溶胶进行化学改性,用非极性溶剂替代乙醇溶剂,涂制的减反膜不需要热处理就可能应用于KDP与KD*P晶体中。单层的改性防潮增透膜的透过率大于99%,膜层均匀性良好,改性膜层本身具有一定的防潮功能,水接触角142o,膜层激光破坏阈值约16.9J/cm2,有希望应用于高功率激光系统的KDP类晶体。
The trends of future 'SG' facility is using KD*P as Third Harmonic Generator(THG), the structural phase transition in high deuterated KD*P reported at around 110 ℃ and the previous coating can not get enough heat treatment. The HMDS modified SiO2 sol in non-polar solvents which need no treatment can be used in both KDP and KD*P crystals. Single modified moisture-resistant antireflective coatings have transmission peak value above 99%, excellent optical homogeneity, the contact angle reaches 142° and the laser damage threshold of this coatings on quartz glass is 16.9 J/cm2 at 1064 nm/1ns. It is hopeful to be applied in high-power laser KDP crystals.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2010年第S2期224-227,共4页
Rare Metal Materials and Engineering
基金
国家高技术研究发展计划("863"计划)(863-804-2)
