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INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD

INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD
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摘要 The photocurrent-voltage characteristics and photoelectric sensitivity of a-Si:H samples with slit and comb electrodes are measured. A method for calculating the charge intensifying gain from the photoelectric sensitivity is proposed. The obtained charge intensifying gain of a-Si:H under an electric field of 105 V/cm through this method is as high as 4.3×103. The generation process of the charge intensification effect in a-Si:H is discussed on the basis of the energy level diagram. And the product of electron’s mobility and its lifetime is calculated from the measured values of the gains. The photocurrent-voltage characteristics and photoelectric sensitivity of a-Si:H samples with slit and comb electrodes are measured. A method for calculating the charge intensifying gain from the photoelectric sensitivity is proposed. The obtained charge intensifying gain of a-Si:H under an electric field of 105 V/cm through this method is as high as 4.3×103. The generation process of the charge intensification effect in a-Si:H is discussed on the basis of the energy level diagram. And the product of electron's mobility and its lifetime is calculated from the measured values of the gains.
出处 《Journal of Electronics(China)》 1999年第1期81-87,共7页 电子科学学刊(英文版)
基金 National Natural Science Foundation of China
关键词 A-SI:H semiconductor CHARGE INTENSIFICATION EFFECT PHOTOELECTRIC sensitivity METHOD a-Si:H semiconductor Charge intensification effect Photoelectric sensitivity method
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