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Sputtering of W Mo alloy under ion bombardment 被引量:2

Sputtering of W Mo alloy under ion bombardment
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摘要 The distribution of plasma density in the vicinity of the W Mo alloy source in the process of double glow discharge plasma surface alloying was diagnosed using the moveable Langmuir probe. The sputtering law, surface composition and morphological variation of the W Mo alloy source was studied. The experimental results show that there exists obvious preferential sputtering on the surface of the W Mo alloy source under the argon ion bombardment; the stable period is reached after a transitional period, and the preferential sputtering occurs in a definite range of composition(mole fraction): 70%~75% Mo, 22%~25% W; there appears segregation on the surface of the W Mo alloy source. The distribution of plasma density in the vicinity of the W-Mo alloy source in the:process of double-glow discharge plasma surface alloying was diagnosed using the moveable Langmuir probe. The sputtering law, surface composition and morphological variation of the W-Mo alloy source was studied. The experimental results show that there exists obvious preferential sputtering on the surface of the W-Mo alloy source under the argon ion bombardment; the stable period is reached after a transitional period, and the preferential sputtering occurs in a definite range of composition(mole fraction): 70 % similar to 75 % Mo, 22 % similar to 25 % W; there appears segregation on the surface of the W-Mo alloy source.
机构地区 Taiyuan Univ Technol
出处 《中国有色金属学会会刊:英文版》 EI CSCD 1999年第3期629-633,共5页 Transactions of Nonferrous Metals Society of China
关键词 metallic CEMENTATION W MO ALLOY preferential SPUTTERING ion BOMBARDMENT metallic cementation W-Mo alloy preferential sputtering ion bombardment
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