摘要
报道了利用新型紫外光源—Ｅｘｃｉｍｅｒ紫外灯辐照制备钽氧化物薄膜的新方法，并对所制备的薄膜进行了Ｘ光光电子能谱（ＸＰＳ）分析，分析结果表明：所制备的钽氧化物薄膜不含碳而且符合化学计量比。
Thin tantalum oxide films have been formed on silicon substrates from tantalum ethoxide sol gel solutions at low temperature using 172 nm radiation from a novel Xe 2 * excimer lamp. Elemental analysis of the tantalum pentoxide films deposited was carried out by X ray photospectroscopy (XPS), the results showed that no carbon in the film was observed and the O/Ta ratio is very close to the stoichiometric ratio of 2.5 for Ta 2O 5.
