Study on the structural characteristics of graphitized carbon microcrystal prepared from PI film using X-ray diffraction technique

The structural characteristics of the graphitized carbon microcrystal prepared from carbonized polyimide (PI) film were explored using X-ray diffraction technique. The experimental results show that the graphitization of the thin film was initiated by heat treatment around 2 100°C; the carbon layers of the thin film specimens heat-treated at 2 825°C and above possessed good orientation, the phenomenon of poly-phase graphitization appeared markedly, and the information of the mosaic structure of the sample was obtained; the interlayer spacing and the mosaic degree for 3 160°C heat-treated thin film samples are 0.335 45 nm and 5.4°, respectively. As far as the source of two crystal phases with a slight difference in graphitization degree is concerned, some inferences are discussed, which helps understand more about the structure of the graphitization products.