摘要
The chemical reaction at solid state between the pressless sintered Si_3N_4 substrate and Ti-de- posited film has been studied by X-ray diffraction analysis.The reaction all depends upon the temperature.It seems no reaction below 973 K:Ti_2N and Ti_5Si_3 form from 1073 to 1123 K: TiN and Ti_5Si_3 form at 1173 K,TiN and Ti_5Si_4 form at 1273 K;while the titanium film di- minishes completely.The lattice parameter of Si_3N_4 is unchanging thrioughout postannealing. This implies that the Ti atoms never dissolve into the Si_2N_4 lattice.
The chemical reaction at solid state between the pressless sintered Si_3N_4 substrate and Ti-de- posited film has been studied by X-ray diffraction analysis.The reaction all depends upon the temperature.It seems no reaction below 973 K:Ti_2N and Ti_5Si_3 form from 1073 to 1123 K: TiN and Ti_5Si_3 form at 1173 K,TiN and Ti_5Si_4 form at 1273 K;while the titanium film di- minishes completely.The lattice parameter of Si_3N_4 is unchanging thrioughout postannealing. This implies that the Ti atoms never dissolve into the Si_2N_4 lattice.
