大面积强流直流离子源

HIGH-CURRENT DC ION SOURCE WITH LARGE RADIATION AREA

为了适应离子注入和离子束动态混合沉积技术工业应用的要求,中国科学院等离子体物理所致力于具有大辐照面积的强流直流离子源的研制。目前引出的离子流对氢为350mA,氮为200mA,氩为150mA,能量达到50keV。源等离子体如同ORNL一样由热阴极反射型弧放电形成,但中间电极几何尺寸与ORNL有较大的不同。引出系统由加-减速栅组成,19个孔径为6mm的孔在三电极上六边形排列。引出面直径为6cm,在距引出栅2m处直径为25cm的靶上测得束的均匀性约90%。

Development of a high-Current DC ion Source with a large radiation area, Soitable for industrial application such as ion implantation and ion beam dymamic mixing deposition, is currently underway at the Institute of plasma Physics, Academia Siniea, Presently achieved curreuts are 350mA (Hydrogen), 200mA (Nitrogen) and 150mA (Argon), and energies are 50keV. The Plasma is formed by hotcathode reflex are (doup IGatron), as ORNL, but the intermediate electrode nose geometry is different from that, A 19—aperture accel-decel extraction column with 6mm diameter apertures in three electrodes is used. The diameter of extraction grides is 6cm, the beam uniformity on the target of diameter 25cm in 2m from the extraction grides is approx. 90%.