大扁杏组培基本培养基与培养条件的优化研究

Large flat apricotTissue CultureBasic medium And Culture conditions of Optimization

以大扁杏龙王帽为材料,研究了外植体的消毒、基本培养基、取材部位和培养条件等因素对组培苗生长的影响。结果表明,采用1 g/L HgCl2与20 g/L NaHCO3按体积比1∶1混合的消毒合剂处理外植体8 min,灭菌成功率可达98%;以改良的MS(1/2NH4NO3)培养基为基本培养基,适合大扁杏的分化培养;最适外植体为茎尖,最佳培养条件为温度25～27℃,光照强度2 000～3 000 lx,光照时间16 h/d,pH 5.6～5.8。

Large fiat apricot Longwangmao were used to study the explant disinfection, basic medium, based on location and culture conditions and other factors on growth of plantlets. The results show that the 1 g/L HgCl2 a n d 20 g/L NaHCO3 Mixed by volume ratio of 1：1 mixture of disinfection treatment Explant 8 min, Sterilization success rate of up to 98%; to modified MS （1/2NH4NO3） medium as the basic medium, Suitable for large flat apricot cultivate differentiation; the most suitable for shoot, tip explants, the best cttlture conditions for the temperature 25 - 27 ℃, light intensity 2 000 - 3 000 lx, illumination thne 16 h / d, PH 5.6 - 5.8.