面曝光快速成形关键技术及研究现状

The Key Technology and Research Status of Mask Projection Stereolithography

全面介绍了面曝光快速成形关键技术、应用及研究现状,指出了其优势和存在的问题;阐述了面曝光快速成型系统组成、掩膜生成方法及关键器件工作原理,分析了LCD作为快速成型掩膜生成器件的失效原因,重点比较了LCD、DMD掩膜生成器件的分辨率、可靠性以及对快速成型的适用性;探讨了掩膜曝光快速成形过程中,树脂曝光固化引起翘曲变形的原理,介绍了改善翘曲变形的方法;最后,根据以上分析以及掩膜生成关键器件的发展现状,提出了面曝光快速成形技术的发展趋势。

This article introduced the key technology, applications ＆ research status of Mask projection Stereolithography （MPS） comprehensive, point out its advantages ＆ disadvantages; especially emphasized the （MPS） system composition and mask generation methods developed nowadays in MPS techniques. The failure reasons of LCD as a rapid prototyping device to generate mask is analyzad, and their device precision and reliability as well as the applicability of rapid prototyping mask generation device is compared. Then the principle of the warpage ＆ distortion in the process of MPS curing and the way to eliminate these defects are discussed. Finally, on the above analysis, the future trends of MPS is presented.