中频磁控溅射NiO_x电致变色薄膜(英文)

Electrochromic Performances of Nanosized Nickel Oxide Films Deposited by Mid-frequency Magnetron Sputtering

采用中频孪生非平衡磁控溅射技术,制备了纳米晶结构NiOx电致变色薄膜。利用原子力显微镜、掠射X射线衍射、电化学设备、紫外分光光度计等测试手段分析薄膜结构及电致变色特性。结果表明:室温沉积获得表面质地均匀的NiOx薄膜;在±3V致色电压下,薄膜电致变色性能优异,对可见光透过率调制范围达30%以上,但薄膜寿命低。获得的薄膜为结构疏松的纳米晶结构,易于离子的注入和抽取,变色性能优异,但易发生Li+不可逆注入,薄膜寿命低。

Nanosized nickel oxide （NiOx） films are deposited by mid-frequency dual-target magnetron sputtering method. The structure, morphology composition and transmittance properties of the films are characterized by atom force microscope （AFM）, grazing-incidence X-ray diffraction （GID）, electrochemical experiment and spectrophotometer. The results show that the as-deposited films prepared at room temperature are of relatively clean surface. Under ±3V, the films have good electrochromic properties whose different transmittance between the bleached and colored states in the visible region reaches 30%, while have relative low lifetime. The structure of as-deposited nanosized NiOx films is beneficial for ions＇ injection and extraction while irreversible injection can easily occur under high applied voltage.