氢气对含金刚石碳薄膜场发射性能的影响

Effect of Hydrogen on the Field EmissionPerformances of Diamond Containing Carbon Films

测试了采用磁控溅射工艺制备得到含金刚石碳薄膜的场发射性能，试验结果表明含金刚石薄膜具有良好的场发射性能，最小场强阈值为３７Ｖ／μｍ，其相应的有效功函数０．２９ｅＶ，最大的场发射电流密度达５．４ｍＡ／ｃｍ２。分析了溅射气体中加入量和基体温度对薄膜晶体结构和场发射性能的影响。

The field emission performances of the diamond containing ccarbon films prepared by magnetron sputtering deposition have been examined. The results show that the diamond containing carbon films present excellent emission characteristics. The optimization emission properties reach in this paper: The minimum shield electronic field strength is 37 V/μm, which results in an effective work function of 0.29 eV; The maximum field emission current reach 5.4 mA/cm 2. The influences of hydrogen and substrate temperature on the microstructures and field emission performances of the films is analysed.