摘要
X-ray光刻(XRL)是微/纳米光刻技术中至关重要的批量复制技术,XRL的发展在于不断对X-ray源、新型的stepper、X线掩模版以及相关处理工艺的研究进展。其中,X线掩模版不仅直接关系到XRL的分辨率水平,也极大地影响其使用效率及其费用。我们在此报道一种采用云母薄片作为载片的新型X-ray掩模版,其载片厚为8μm,自支撑能力、平直光滑度等几方面都符合高分辨率光刻的要求。基此采用新的工艺可大大简化制作步骤,降低造价,并可在0.5-1.5nm波长范围内的X-ray光刻中获得实际成功的应用。
X ray lithography (XRL)is a very important batch exposure technology in micro/nanometer lithography.The development of XRL requires new X ray source,new type of stepper,new X ray masks and advanced related processing technology.The X ray mask give an important effect on the resolution of XRL and it's efficiency and expenses.A new type of X ray mask,in which the mica sheet with thickness and of 8μm was used as the substrate,is reported. The soundness and Flakness meet the requirements of high resolution lithography.Based on the technology the X ray exposure with wavelength 0.5 1.5nm has been successfully achieved.The processing has simple steps and low cost.
出处
《微细加工技术》
1998年第2期37-40,共4页
Microfabrication Technology
基金
中国科大同步辐射国家开放实验室开放课题
关键词
X线光刻
云母载基
X线掩模版
XRL
X ray lithography (XRL)
high resolution
mica based X ray mask