微区微纳米压印技术及设备

Design of distributed micro-area micro/nano-imprinting lithographic system

为了实现在大幅面基底上制作微纳结构，开发了一种新型的分布微区微纳米压印技术和相应的设备。介绍了分布微区微纳米压印的技术设想，并以提高压印稳定性和设计可旋转压印头为目标，设计了气动驱动装置和压印头结构。然后，通过实验检测了平台运动精度，并在碳酸聚酯材料上热压印了周期为400nm的光栅。最后，以背光模组用光扩散片为应用实例．介绍了分布微区微纳米压印技术与设备的可能应用领域。实验结果表明，在1m的行程范围上，平台位移精度可达100nm，压印头旋转角度为-90°～90°，压印深度可由加热温度和驱动力大小控制。制作的扩散片厚度为125μm，扩散半径为5mm。微区微纳米压印技术和设备特别适合大幅面光学衍射图像和平板显示器件的微结构制作。

To fabricate micro/nano structures on a large-format substrate, a novel miro-area micro/ nanoimprinting lithographic system was presented,and the design of this imprinting system was introduced. Focused on improving stability and realizing the rotation of an imprinting mould, the gas circuit and configuration of the imprinting mould were discussed in detail. By use of polycarbonates,the gratings with a period of 400 nm were fabricated and the precision of the platform was given. Then, by taking the fabrication of a diffusing film in a backlight unit of flat panel displays as an example, the potential application of a distributed micro-area micro/nano-imprinting lithographic method was proposed. The experimental results indicate that the positioning precision of the platfom in an 1 m long stroke is 1 nm and the rotating angle varies from -90° to 90° when the imprinting depth is controlled by heating temperature and gas pressure. A diffusing film with a thickness of 125 μm was fabricated, whose diffusing radius is 5 mm. These results suggests that the proposed micro-area nanoimprinting lithographic system should be especially suitable for fabrication of optical variable diffraction images and devices used in flat-panel displays.