制备条件对含铜阳极氧化铝复合薄膜偏振特性的影响

Effect of Preparation Conditions on Polarization Properties of Cu/PAA Films

利用多孔阳极氧化铝(PAA)的纳米列阵结构,将金属铜电镀到氧化铝的孔中,得到含有金属铜纳米列阵阳极氧化铝(Cu/PAA)膜。实验中发现,Cu/PAA膜的偏振特性与电镀条件有关。在一定的范围内,随着电镀时间和电流密度的增加,消光比增大。电镀溶液的温度也是影响Cu/PAA膜消光比的一个很重要的因素,在电镀溶液温度相对较高的情况下,电流密度相对较小时也可以获得相对较高的消光比。通过优化电镀条件可获得高效率的Cu/PAA膜微偏振器。这种电化学方法制备的微偏振器,制备工艺简单,尺寸可控,便于实现产业化,有广泛的应用前景。

In recent years, there has been increasing interest in the fabrication of the ordered fine structure using the naturally occurring self-ordered structures because of their potential utilization in the development of micromechanical, electronic and optoelectronic devices. The porous anodic alumina （PAA） formed by electro- chemical oxidation has a fine structure with a nanohole array, and the radius of the pores can be controlled in the range of 1.5 to 500 nm by changing the preparation conditions. The PAA has recently attracted increasing attention as a host by introducing a guest. In this paper, Cu was implanted into the pores of PAA by means of electroplating, and the Cu/PAA film was obtained. With such metallic array, the alumina films exhibit optical polarization properties. The experiment results indicated that the polarization properties of Cu/PAA film depend on electroplating conditions. a certain extent, with the increase of electroplating time and current density, the extinction ratio of Cu/PAA film can be improved; the temperature of electroplating solution is an important factor to influence on the ex- tinction ratio, because a higher extinction ratio can be obtained at a smaller density and a higher temperature. So, a micro-polarizer can be achieved by optimizing electroplating conditions. With the simple technique, the controlled size and the convenience for industrialization, the Cu/PAA film prepared by electrochemical oxida- tion has extensive prospects in optical telecommunication.