摘要
结合模拟退火和遗传算法各自的特点,提出了一种混合算法,用以设计阵列型惯性约束核聚变(ICF)均匀照明系统中二元阵列单元的位相分布。混合算法充分利用了遗传算法的并行性及保留一定历史信息的特性,并用模拟退火的温度参数控制收敛性。模拟运算表明,混合算法具有较高的效率及寻优可靠性。用本算法设计的均匀照明阵列,可以得到顶部均匀性为3.2%(rms)。
In this paper, a novel hybrid algorithm which combines SA (simulated annealing) algorithm with GA (genetic algorithm) is used to design binary optics elements for ICF (inertial confinement fusion) uniform illumination. GA, which is a parallel algorithm, reserves historical information for SA, while SA′s parameter, temperature, is used to control GA′s convergence. Simulation calculation shows that the hybrid algorithm is effective and robust. A focal spot with a uniformity 3.2%(rms) and an efficiency approximating to 90% is obtained by this method.
出处
《中国激光》
EI
CAS
CSCD
北大核心
1998年第3期265-269,共5页
Chinese Journal of Lasers
基金
国家高技术惯性约束委员会及国家自然科学基金
关键词
模拟退火
遗传算法
ICF均匀照明
二元光学器件
simulated annealing algorithm (SA), genetic algorithm(GA), hybrid algorithm, ICF uniform illumination, uniformity