纳米V_2O_5薄膜的制备与特性

Preparation and Characteristics of V_2O_5 Thin Film

采用溶胶-凝胶法在Si和普通玻璃基底上制备V2O5纳米薄膜。在空气中对样品进行不同温度的退火处理。利用X射线衍射、扫描电子显微镜和分光光度计对制备的V2O5薄膜的结构、形貌和光学特性进行研究。XRD和SEM研究结果表明:可以通过升高退火温度来提高薄膜的结晶程度、颗粒尺寸及其均匀程度,并增强V2O5的择优取向性。透射谱和吸收谱的研究结果表明:随着退火温度的升高,V2O5薄膜的吸收边缘发生红移,光学带隙逐渐变窄。

The V2O5 thin film was prepared on the substrates of Si glass and commercial glass by the sol-gel technique. The samples prepared were annealed in air atmosphere at different temperatures. The microstrueture, the morphology and optical properties of V2O5 thin films were studied by XRD, SEM and spectrophotometer. The results of XRD and SEM indicate that the better crystalline states and orientation with V2O5 （001） and （200） after annealing can be obtained, and the grain homogeneity on nano-V2O5 film surface can be improved through proper increasing of annealing temperatures; The results of transmission and absorption spectra show that a red shift will occur at the absorption edges of V2O5 films, and optical band gaps are shortened gradually with the increase of annealing temperature.