摘要
在理论分析的基础上,设计制作了500V/11AVDMOSFET芯片,并且进行了失效分析,从而进一步解决了设计和工艺中存在的问题,提高了成品率.最后指出了今后努力的方向.
A VDMOSFET(500 V/11 A) was designed and fabricated on the basis of theoretical analysis in this paper. Furthermore, a fault analysis was performed and problems in designs and processes were solved to increase yield. Finally, further research needs were indicated.
出处
《西安交通大学学报》
EI
CAS
CSCD
北大核心
1998年第5期22-25,30,共5页
Journal of Xi'an Jiaotong University
基金
国家自然科学基金