摘要
用磁控溅射法在载玻片上镀制了难混溶体系Al/Pb金属纳米多层膜,考察了调制波长对Pb膜成膜的影响,借用Philip XL370型扫描电子显微镜研究了成膜质量、表面形貌及膜层断面结构形貌,并采用X射线观测了样品中Al、Pb相的存在形式和膜层结构变化。结果表明,当Pb膜达到一定厚度时,可得到均一、致密的难混溶体系Al/Pb金属纳米多层膜。探讨了膜的形成机理,给出了成核过程模型,并进一步修正了传统成膜机制。
Immiscible system of Al/Pb metal nano-multilayer is obtained through magnetron sputtering depositing on glass slides. The relationship between the wavelength and the film formation of Pb muhilayer is researched. The film properties, surface appearance and structure of the cross section are investigated by Philip XL370 scanning electron microscopy. The phase existence of Al and Pb and the change of the film structure are observed by X-ray. It indicates that thick homogeneous immiscible alloy system of Al/Pb multilayer can be obtained while the film is getting to a certain thickness. The model of the nucleation process is presented in the paper. The formation mechanism of the film is also discussed and traditional mechanism is refined.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2009年第8期14-17,共4页
Materials Reports
基金
云南省自然科学基金资助项目(2004E0004Z
2006E0018Q)
关键词
难混溶体系
Al/Pb金属纳米多层膜
成膜质量
表面形貌
immiscible system, Al/Pb metal nano-multilayer, film formation properties, surface appearance