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用于激光直写灰度掩模的二元金属薄膜的制备及光学性质 被引量:2

PREPARATION AND OPTICAL PROPERTY OF BIMETALLIC THIN FILMS FOR LASER DIRECT-WRITE GRAY-LEVEL MASK
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摘要 利用磁控溅射方法制备了Zn/Al二元金属薄膜,得出了制备Zn/Al二元金属薄膜的工艺参数。论述了其在激光直写灰度掩模中的应用。 Zn/Al bimetallic thin films were prepared on glass substrate by RF magnetr-ron sputtering, and deposition parameters of Zn/Al bimetallic thin films was obtained. Applications for laser direct-write gray-level mask were also discussed.
机构地区 兰州物理研究所
出处 《真空与低温》 2009年第1期1-4,共4页 Vacuum and Cryogenics
基金 表面工程技术国家级重点实验室基金项目(NO.51418060305HT6007)资助。
关键词 二元金属薄膜 磁控溅射 激光直写 灰度掩模 bimetallic thin film RF magnetron sputtering laser direct writing gray-level mask
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参考文献10

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