摘要
利用磁控溅射方法制备了Zn/Al二元金属薄膜,得出了制备Zn/Al二元金属薄膜的工艺参数。论述了其在激光直写灰度掩模中的应用。
Zn/Al bimetallic thin films were prepared on glass substrate by RF magnetr-ron sputtering, and deposition parameters of Zn/Al bimetallic thin films was obtained. Applications for laser direct-write gray-level mask were also discussed.
出处
《真空与低温》
2009年第1期1-4,共4页
Vacuum and Cryogenics
基金
表面工程技术国家级重点实验室基金项目(NO.51418060305HT6007)资助。
关键词
二元金属薄膜
磁控溅射
激光直写
灰度掩模
bimetallic thin film
RF magnetron sputtering
laser direct writing
gray-level mask