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二氧化钒薄膜退火特性研究 被引量：2

CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING
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摘要 用磁控反应溅射法加退火工艺在石英玻璃上制备出具有相变特性的二氧化钒薄膜,通过XRD、SEM和波长200～2500nm的光学透过率的测试对薄膜的结构和特性进行分析,研究退火对薄膜的结构和光电特性的影响。 Vanadium dioxide thin films on quartz glass have been prepared by reactive magnetron sputtering methods and annealing process. Structural and electrical-optical properties have been characterized by XRD, SEM, resistance and optics transmittance measurements in wavelength between 200-2 500 nm. Influence of annealing on thin film properties was given.
作者 牟永强 冯浩 梁耀廷 崔敬忠
机构地区 兰州物理研究所
出处 《真空与低温》 2009年第1期21-24,共4页 Vacuum and Cryogenics
基金 总装备部预研课题项目(编号:51318060208)资助。
关键词 二氧化钒 薄膜 电学特性 光学透过率 Vanadium dioxide thin film electrical property optical transmittance
分类号 O484 [理学—固体物理]
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参考文献9

  • 1GOODENOUG J B. The two components of the crystallographic transition in VO2 [J]. Journal of Solid State Chemistry, 1971,3:490-500.
  • 2NIHOUL G, LEROUX CH, MADIGOU V,et al. Application of the static concentration waves theory to structural transitions in some oxides [J]. Solid State Ionics, 1999,117:105-112.
  • 3GUINNETON FREDERIC,VALMALETTE JEAN-CRISTOPHE, JEAN-RAYMOND GAVARRI. Nanocrystalline vanadium dioxide: synthesis and mid-infrared properties [J]. Optical Materials, 2000,15:111 - 114.
  • 4KUMAR R T R, KARUNAGARAN B, MANGALARAJ D, et al. Room temperature deposited vanadium oxide thin films for uncooled infrared detectors [J]. Materials Research Bulletin, 2003,38 (7): 1235-1240.
  • 5YOON Y S,KIM J S,CHOI S H. Structural and electrochemical properties of vanadium oxide thin films grown by d.c. and r.f. reactive sputtering at room temperature [J]. Thin Solid Films, 2004,460( 1/2):41-47.
  • 6HANLON T J,WALKER R E,COATH J A,et al. Comparison between vanadium dioxide coatings on glass produced by sputtering, alkoxide and aqueous sol-gel methods [J]. Thin Solid Films, 2002,405( 1/2):234-237.
  • 7GOLAN G,AXELEVITCH A,SIGALOV B,et al. Metal-insulator phase transition in vanadium oxides films [J]. Microelectronics Journal,2003,34(4):255-258.
  • 8CUI JING-ZHONG, DA DAO-AN, JIANG WAN-SHUN. Structure characterization of vanadium oxide thin films preparedby magnetron sputtering methods [J]. Applied Surface Science, 1998,133:225-229.
  • 9梁耀廷,崔敬忠,达道安,刘向,李智.氧化钒薄膜制备与特性研究[J].真空与低温,2004,10(2):71-74. 被引量：5

二级参考文献3

  • 1BILL MEYER, ROBERT CANNATA, ARTHUR STOUT, et al. Ambers uncooled microbolometer LWIR camera[J]. Proc SPIE, 1996, 2 746:13-22.
  • 2CHARLES MARSHALL, NEAL BUTLER, RICHARD BLACKWELL, et al. Uncooled infrared sensor with digital focal plane array[J]. Proc SPIE, 1996. 2 746: 23-31.
  • 3JCC FAN, HR FETTERMAN, BACHNER F J, et al. Thin film VO2 submillimetter wave modulators and polarizers[J].Appl Phys Lett, 1977, 31:11-14.

共引文献4

同被引文献29

  • 1田雪松,刘金成,掌蕴东,鲁建业,王骐.二氧化钒薄膜的退火组分变化及光学特性研究[J].激光技术,2005,29(3):332-333. 被引量：8
  • 2沈楠,王双保,黄光,李毅,易新建.低温热致变色VO_2薄膜的制备及应用[J].光电子．激光,2005,16(10):1227-1230. 被引量：6
  • 3Morin F J. Oxides which show a metal-to-insulator transition at the neel temperature[J]. Physical Review Letters, 1959,3(1) : 34-36.
  • 4Chiarello G,Barberi R,Amoddeo A, et al. XPS and AFM char- acterization of a vanadium oxide film on TiO2 (100) surface [J]. Applied Surface Science, 1996,Y9(1) : 15-19.
  • 5Balberg I, Trokman S. High-contrast optical storage in VO2 films[J]. Journal of Applied Physics, 1975,46 (5) : 2111-2119.
  • 6WANG Hong-chen, YI Xin-jian and LI Yi. Fabrication of VO2 films with low transition temperature for optical switching ap- plications[J]. Optical Communications, 2005,256 ( 4-6 ) : 305- 309.
  • 7YIN Da-chuan, XU Nian-kan, ZHANG Jing-yu, et al. Vanadium dioxide films with good electrical swithing[J]. Journal of Phys- ics D:Applied Physics,1996,29(4) :1051-1057.
  • 8Babulanam S M, Eriksson T S, Niklasson G A,et al. Thermo- chromic VO2 films for energy-efficient windows[J]. Solar Ener- gy Materials, 1987,16(5) : 347-363.
  • 9Oase F O. Reactive evaporation of anomalous blue V02 [J]. Applied Optics, 1987,26(8) : 1550-1553.
  • 10Kim D H, Kwok H S. Pulsed laser deposition of VO2 thin films [J]. Applied Physics Letters,2009,65(25) :3188-3190.

引证文献2

二级引证文献3

真空与低温
2009年 第1期

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