脉冲电刷镀镍中沉积速度的影响因素

Factors Affecting the Deposition Rate of Poised Electro-Brush Plated Nickel Coating

以硫酸镍为主盐、柠檬酸铵为配位剂、硫酸铈为添加剂、醋酸铵与氨水组成缓冲溶液,研究了脉冲参数和硫酸铈含量对脉冲电刷镀镍镀层沉积速度、耐腐蚀性和表面形貌的影响。结果表明:在适当的脉冲参数下,能够得到孔隙率低、致密性好的沉积层;镍镀层中没有铈共沉积;随着硫酸铈的加入,镀层沉积速度加快,镀层结晶更致密,镀层内应力减小。最佳工艺条件:245.0 g/L硫酸镍,120.0 g/L柠檬酸铵,30.0 g/L醋酸钠,140.0 g/L氨水,0.6 g/L硫酸铈,占空比55%,频率1 100 Hz,电压10 V。

Pulsed electro-brush plated Ni coating was prepared using nickel sulfate as the major salt, ammonium citrate as the coordination agent, cerium sulfate as the additive, and ammonium acetate-ammonia water as the buffer so-lution. The effects of the pulse parameter and content of ceriumsulfate on the deposition rate, corrosion resistance, and appear-ance of the Ni coating were investigated. Results show that by se-lecting proper pulse parameters, it was feasible to obtain Ni coat-ing with a low porosity and good compactness, and Ce was not codeposited in the Ni coating. The introduction of cerium sulfate contributed to speed the deposition, refine the crystalline, and re-duce the internal stress of the Ni coating. The optimized bath was composed of 245. 0 g/L NiSO4, 120. 0 g/L ammonium citrate, 0.6 g/L Ce(SO4) 2, 30.0 g/L CH3COONa, 140.0 g/L ammonia water, while the optimized parameters were suggested as duty ra-tio 55%, frequency 1 100 Hz, and voltage 10 V.