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照射后HeLa细胞对CDDP诱导的DNA交联产生抗性

Resistance of HeLa Line Irradiated with 60Co γRay to the Interstrand DNA Crosslink Induced by Diamminedichloroplatinum
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摘要 应用EB荧光分析法测定了人宫颈癌上皮细胞系(HeLaline)经单次60Co照射后顺铂(CDDP)诱导的DNA链内交联反应(ct%).经研究发现,1~6Gy照射后,细胞相对生长分数(fractionofcontrolgrowth,FCG)减小,单位细胞DNA含量增高,HeLa细胞与CDDP的交联反应明显降低,且与照射剂量呈依赖关系.结果提示,γ射线照射后存活的肿瘤细胞可能对CDDP或烷化剂的化学治疗作用产生抗性. The detection of DNA crosslink induced by diaminedichloroplatinum (CDDP) in HeLa line irradiated with 60Co γray was carried out using ethidium bromide fluorescence assay. The results showed that after single doses (1~6 Gy)of irradiation, the fraction of control growth of HeLa cells declined and the DNA content per unit cell of HeLa line increased, and the formation of interstrand DNA crosslink induced by CDDP reduced apparently with increments of dose of irradiation. The findings suggest that tumor cells surviving γirradiation may become resistant to chemotherapy with alkylating agents such as CDDP.
出处 《生物化学与生物物理进展》 SCIE CAS CSCD 北大核心 1998年第1期84-86,共3页 Progress In Biochemistry and Biophysics
关键词 细胞系 DNA 交联反应 荧光分析法 宫颈肿瘤 HeLa line, DNA crosslink, resistance, EBfluoresecence assay
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