N^+注入Ti/Si_3N_4的摩擦行为研究

THE TRIBOLOGICAL PROPERTIES OF Ti/Si3N4 IMPLANTED BY N IONS

研究了Ｓｉ３Ｎ４陶瓷材料及镀膜Ｔｉ／Ｓｉ３Ｎ４材料当Ｎ＋注入前后的摩擦学行为，考察了样品表面划痕轨迹的ＳＥＭ形貌，结合Ｘ射线衍射，对离子注入改性机理和摩擦学性能进行了探讨．

In this paper, the tribological properties of Si3N4 and Ti/Si3N4 implanted by N ions are studied. The topography of implanting and scratching trace were examined using SEM. By X-ray diffraction for the implanted thin film, the new phase of Ti2N on Ti/Si3N4 layer by N+ implantation was shown. The wear and friction mechanism are also discussed in the paper. Ion beam mixing of interface improves the adhesion between Ti film and Si3N4 substrate.