采用热丝CVD法在多种基材上沉积金刚石薄膜

Diamond Films Deposited on Various Substrates by Means of Hot Filament Vapor Deposition

热丝法是一种比较成熟的气相合成金刚石膜的方法,与其它方法比较,热丝法在工艺参数对金刚石薄膜的结构和质量的影响、界面的形成、薄膜生长各阶段的特征等方面的基础研究及各种应用研究上有其独特的优越性.木文采用热丝法在SiC晶须增强Si_3N_4.陶瓷、AIN陶瓷、Si单晶片、Cu片、Mo片等基材上沉积出金刚石薄膜,并通过TEM和SEM进行观察,分析和研究了影响金刚石薄膜沉积的因素.

Diamond films have been deposited on various substrates by means of hot filament chemical vapor deposition (CVD). The characteristics of diamond films were observed and studied by means of TEM and SEM.