牙科用镍铬合金表面等离子磁控溅射氮化钛膜对镍离子析出的影响

Study on ion release of Ni from dental NiCr alloy by plasma magnetron reactive sputter deposition

目的:研究等离子磁控反应溅射TiN膜对镍铬合金Ni离子析出的影响。方法:利用等离子磁控反应溅射技术在牙科用镍铬合金表面沉积TiN离子膜,以未溅射前为对照,浸泡于人工唾液中,通过电感偶合等离子体发射光谱-质谱连用仪(ICP-MS)定量检测Ni离子析出量。结果:沉积了TiN膜后的镍铬合金镍离子析出量均数为634.3ng/ml,而未沉积组Ni离子析出均数为3894.3ng/ml。经t检验两者具有显著的统计学差异(p<0.05)。结论:牙科用镍铬合金表面等离子磁控反应溅射TiN膜Ni离子的析出量有显著降低。

Objective： To investigate the effect of TiN film deposited by plasma magnetron reactive sputter deposition technique on ion release of Ni from dental NiCr Alloy. Method： TiN film was deposited on the surface of dental NiCr alloy by . lasma magnetron reactive sputter deposition technique. The control group was that NiCr alloy without TiN film. Both groups were exposed into artificial saliva respectively. The metal ions of Ni were measured by inductive coupled plasma emission spectrometer-mass Spectromer. Result： The average ions of Ni of NiCr with TiN film were 3894.3 ng / ml while that without TiN film were 634.3 ng/ ml.The data between groups has significant statistic difference （P〈0.05）. Conclusion： Compared with NiCr alloy without TiN film, the ions of Ni released from NiCr with TiN film were much more reduced.