摘要
Mo＋C离子注入TiN薄膜后，在TiN薄膜注入层形成纳米纤维结构。纳米纤维丛排列整齐，结构完整，长度较长，均匀弥散在TiN晶体中。在距离表面深度为50-150nm的区域，也能够产生TiN纳米纤维，但长度较短，排列基本规则。能谱分析显示，注入能量为80ke V的Mo离子注入TiN薄膜表面内的注入投影射程为50nm左右，但离子注入的影响区域远大于投影射程；新生成的纳米纤维丛为富Mo相，Mo含量为17％～25％。Mo＋C二元注入的表面强化效果优于Mo一元注入，较高剂量的Mo＋C注入条件下，TiN薄膜表面显微硬度更高。
After the Mo＋C ion implantating, the nano fiber structures were formed in the surface of TiN film. The fiber had a diameter of 2-10 nm, and dispersed uniformly in the TiN film surface. With the help of energy transfer to the deeper zone of the TiN film, nano fiber structures were observed in the fields beneath the surface at 50~150 nm. But the fibers in this zone were shorter in length, and had more defects. EDS showed that, when ion energy of 80 keV was used, the projected range of Mo on TiN was about 50 nm, but Mo ion implantation had a much larger affected zone. The new dispersed phase was rich in Mo, and it contained Mo about 17%-25%. By testing the HV hardness, the dual ion implantation of Mo＋C is much better than the unitary ion implantation of Mo. The Vickers hardness increased with the ions＇ dose.
出处
《物理测试》
CAS
2009年第3期32-36,共5页
Physics Examination and Testing
