分形几何学在钽电容界面形貌图像处理中的应用

APPLICATION OF FRACTAL GEOMETRY IN DEALING WITHIMAGE OF INTERFACE MICRO-MORPHOLOGY INTANTALUM CAPACITOR

利用无规分形对钽电容中ＭｎＯ２／Ｔａ２Ｏ５和Ｔａ／Ｔａ２Ｏ５界面的ＳＥＭ形貌进行了图像处理．根据得出的分形维数值，验证了被膜过程为化学反应控速，阳极氧化击穿过程为扩散控速．

The concept of irregular fractal dimension is used to dealing with the SEM image of the interface of Ta/Ta2O5 or Ta2O5/MnO2 in capacitor films. According to the value of fractal dimension, it is suggested that chemical reaction be the ratecontrolling stepin the film coatingprocess, but diffusion be the controlling step during the anodic puncture. 