新的晶圆级1/f噪声测量法

Novel Measurement on 1/f Noise of Wafer Level

提出了一种新的可靠的晶圆级1/f噪声测量方法和架构。测试架构采用了吉时利的一系列仪器,包括4200-SCS、428和一个低通滤波器,并且采用了吉时利的自动特征分析套件(ACS)软件来控制测量仪器的操作,采集/分析测得的数据。由于所用的低通滤波器能够消除所有高于0.5Hz的噪声,因此大大提高了1/f噪声的测量精度。利用这一测量架构能够在各种偏压条件下评测具有不同尺寸的nMOS和pMOS器件的1/f噪声特征。

A new robust measurement method and setup on the 1/f noise of wafer level was developed. The test setup was constructed of the Keithley series of instruments including Keithley Instrument 4200-SCS, Keithley Instrument 428 and a customized low pass filter. A Keithley software of automation characterization suite （ACS） was applied to control the operation of measurement instruments and to acquire/analyze the measured data. Since the adopted low pass filter can remove any higher frequency noise than 0.5 Hz, the measurement accuracy on the 1/f noise is significantly improved. Using the setup, the 1/f noise characteristics of nMOS and pMOS devices with different sizes under different bias conditions can be evaluated.