场致电子发射薄膜材料研究评述

A Critical Review of Field-Electron-Emission Thin Film Materials

场致电子发射(场发射)薄膜材料由于在场发射平板显示器、电子源等诸多高性能真空微电子器件上具有广阔的应用前景,引起了人们广泛的关注与研究兴趣。综述了场发射薄膜材料的理论与实验研究进展,并评述了场致电子发射薄膜材料研究的瓶颈问题及未来发展方向与趋势。

Extensive and potential applications of field - electron - emission thin film materials in field emission display （FED） , electron source, and other high - performance vacuum microelectronic devices have attracted interests and attentions of many researchers. The theoretical and experimental development of field - electron - emission thin film materials is briefly reviewed. Key problems, the directions of future development, and studies regarding field -electron -emission thin film materials are also pointed out.