TA2表面磁控溅射CNx/SiC薄膜的纳米压痕与摩擦磨损性能

Nanoindentation and Friction/Wear Behaviors of Magnetron Sputtered CNx/SiC Bilayer Films on Titanium(TA2) Substrate

采用室温磁控溅射技术在工业纯钛(TA2)表面制备出氮化碳/碳化硅(CNx/S iC)双层薄膜,S iC为中间层.研究了CNx薄膜的纳米压痕行为和摩擦磨损性能.试验结果表明:CNx薄膜的纳米硬度(H)为15.80 GPa,杨氏弹性模量(E)为130.88 GPa,硬度与弹性模量比值(H/E)为0.121;与4 mm的氮化硅球对摩,在载荷1.96 N、室温Kokubo人体模拟体液条件下,CNx薄膜的磨损速率为10-6mm3/(m.N)级,摩擦系数约为0.124,磨损后薄膜未出现裂纹和剥落.分析表明,薄膜具有的良好抗磨性能与其H/E高、抗腐蚀性强以及摩擦系统摩擦系数低相一致.

The nano - indentation and friction/wear properties of CNx film in CNx/SiC （carbon nitride/silieon carbon） double layer thin film （ SiC film as interlayer） deposited on titanium （ TA2 ） substrate using magnetron sputtering at room temperature were investigated. The results show that the CNx film exhibited a nano - hardness of 15.80 GPa, a Young＇s modulus of 130.88 GPa and a hardness -to -modulus ratio of 0. 121. When sliding against a Si3N4 （silicon nitride） ball （2 mm in radius） using ball -on -disc type wear tester at room temperature lubricated by Kokubo simulation body fluid and 200 g load, the CNx film exhibited the friction coefficient of about 0. 124 and the specific wear rate on the order of 10^-6 mm^3/（ m·N） without film cracking and interface delaminating. The good wear - resistance was in accordance with high hardness - to - modulus ratio and good corrosion - resistance of the CNx film, and the low friction coefficient of the tribo - system.