用于LCD的氧化铝阻挡层的射频反应溅射沉积及其特性

Preparation and Properties of Al_2O_3 Barrier Layers for LCD by RF Reactive Sputtering

用金属铝靶射频反应溅射制备了Al2O3薄膜，用作LCD基片玻璃的钠离子阻挡层。报道了射频溅射参数对薄膜沉积速率和折射率的影响。测试结果表明，所沉积的Al2O3薄膜满足LCD器件阻挡层的要求。

Al2O3 thin films used for LCD barrier layers were prepared by RF sputter ing with Al target. The effects of the process parameters to the deposition rate and refrac tive index of Al,O, films were reported- The properties of Al,O, films used for barrier lay ers were tested. It was showed that the deposited films meet the needs for LCD