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磁控共溅射制备Ti-Al-Nb薄膜热处理后的组织形貌

Microstructure Morphology of Ti-Al-Nb Film Prepared by Magnetron Co-sputtering after Heat Treatment
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摘要 采用磁控共溅法制备了Ti-A l-Nb合金薄膜,并将所制备的薄膜在不同温度进行真空热处理,比较了经不同温度热处理的薄膜的组织形貌。结果表明,薄膜主要以核生长方式形成,随着热处理温度的提高,溅射薄膜颗粒增大,表面粗糙度增加。 Ti-Al-Nb intermetallics films were prepared by a magnetron co-sputtering,they were vacuum heat treated at different temperatures and then their microstructure morphologies were compared with each other. The results show that the magnetron co-sputlered films will be essentially formed in the manner of nucleus growth and that the grain demention and the surface roughness of film will all increase with the enhancement of heat treatment temperature.
出处 《热处理》 CAS 2009年第3期48-50,共3页 Heat Treatment
关键词 TI-AL-NB 磁控溅射 真空热处理 Ti-Al-Nb film magnetron sputtering vacuum heat treatment.
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参考文献5

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