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外源一氧化氮对低温胁迫下枇杷叶片AsA-GSH循环的影响 被引量:45

Effects of exogenous NO on ascorbate-glutathione cycle in loquat leaves under low temperature stress
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摘要 采用0.2、0.5、1.0和1.5mmol·L-1的硝普钠(SNP)处理3年生‘早钟6号’枇杷幼苗,以喷清水为对照(CK),于-3℃低温胁迫处理6h后在25℃下培养4d,测定恢复0、1和4d时叶片非酶抗氧化物质和抗氧化酶活性的变化.结果表明:与CK相比,经SNP处理的枇杷叶片过氧化氢(H2O2)含量降低,还原型谷胱甘肽(GSH)和抗坏血酸(AsA)含量及抗坏血酸过氧化物酶(APX)、谷胱甘肽还原酶(GR)、脱氢抗坏血酸还原酶(DHAR)和单脱氢抗坏血酸还原酶(MDAR)活性升高.低温处理后恢复4d时,经0.5mmol·L-1SNP处理的枇杷叶片H2O2含量下降至CK的75.53%,而GSH和AsA含量分别比CK增加了29.12%和23.40%,APX、GR、DHAR和MDAR活性分别比CK增加了50.0%、44.4%、49.53%和62.68%.适当的外源NO处理可提高枇杷叶片的抗氧化系统活性,减轻细胞在低温胁迫下的损伤,其中以0.5mmol·L-1的SNP处理效果较理想. Three-year-old ' Zaozhong No. 6' loquat ( Eriobotrya japonica Lindl. ) seedlings were foliar-sprayed with 0. 2, 0. 5, 1.0 and 1.5 mmol· L-1 of sodium nitroprusside (SNP) , subjected to low temperature ( -3 ℃) stress for 6 hours, and then cultured at 25 ℃ for four days. The antioxidant metabolites and enzymes in the seedling leaves were determined 0, 1, and 4 days after recovery. Comparing with the control (water spraying), all SNP treatments had a decreased H2O2 content but an increased content of glutathione (GSH) and ascorbic acid (AsA) and increased activity of ascorbate peroxidase (APX), glutathione reductase (GR), dehydroaseorbate reductase (DHAR) and monodehydroascorbate reductase (MDAR) in the seedling leaves. Four days after recovery, the H2O2 content in the seedling leaves treated with 0. 5 mmol· L^-1 of SNP decreased by 75.53% , while the GSH and AsA contents and the APX, GR, DHAR and MDAR activities were increased by 29. 12%, 23.40%, 50. 0%, 44. 4%, 49.53%, and 62. 68%, respectively. All of these suggested that appropriate dosage of exogenous NO could enhance the activity of antioxidant system in loquat leaves and alleviated the cell injury of loquat leaves under low temperature stress. In this study, the appropriate dosage of NO was 0. 5 mmol · L^-1 of SNP.
出处 《应用生态学报》 CAS CSCD 北大核心 2009年第6期1395-1400,共6页 Chinese Journal of Applied Ecology
基金 福建省科技厅重点项目(2007I0021) 福建省自然科学基金项目(2008J0071)资助
关键词 外源NO 枇杷叶片 抗氧化 低温胁迫 exogenous NO loquat leaf antioxidant low temperature stress.
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