摘要
多孔型铝阳极氧化膜常被用作制备纳米阵列材料的模板,然而阻挡层的存在却在很多方面制约了其应用。为此,已经提出了各种不同的方法来去除阻挡层。本文将这些方法分为2类,即剥离氧化膜去阻挡层和不剥离氧化膜去阻挡层。前者包括化学腐蚀法、干蚀法、电解剥离法;后者包括阶梯降压法、高电流击穿法、电化学法和有多孔铝支撑的化学溶解法。其中,化学腐蚀法和干蚀法的工艺条件已相当成熟,得到了广泛应用,而其它几种方法还多处于实验室研究阶段。由于氧化膜脆性很大,因此,不剥离氧化膜原位去除阻挡层的方法具有更大的实用价值。
Porous anodic aluminum oxide membranes are widely used as template for fabricating nano-materials array, but its applications are limited by the barrier layer. Therefore, various methods had been presented for removing the barrier layer, which were classified into two kinds in this paper: one is ex-situ method (detaching oxide membranes method) and the other is in-situ method (non-detach oxide membranes method). The former includes chemical etching, dry etching, and electrochemical detachment. The latter includes voltage reduction sequence, high electric field penetration, electrochemieal methods and chemical etching with porous aluminum supporting. In these methods, chemical etching and dry etching have been widely used, while others remain within the confines of laboratory. Considering the brittleness of the oxide membranes, in-situ methods are superior to ex-situ methods from the viewpoint of practical utility.
出处
《化学通报》
CAS
CSCD
北大核心
2009年第6期516-523,共8页
Chemistry
基金
浙江省自然科学基金项目(501070
Y405503)资助
关键词
铝阳极氧化膜
阻挡层
通孔
化学腐蚀
阶梯降压
Anodic aluminum oxide membrane, Barrier layer, Through-hole, Chemical etching, Voltage reduction sequence