电化学沉积ZnSe薄膜的工艺研究

STUDY ON TECHNOLOGY OF EELECTROCHEMICAL CO-DEPOSITION FOR ZNSE THIN FILMS

从理论上分析了硫酸锌和亚硒酸钠在简单酸性溶液中进行电化学共沉积制备ZnSe薄膜的可行性;然后,在硫酸锌和亚硒酸钠的酸性柠檬酸钠电解液体系中进行ZnSe薄膜生长条件系列实验,为了进一步研究电化学沉积参数对薄膜成分和形貌的影响,采用正交试验方法,对pH值、离子的浓度比、电流密度、络合剂、温度等沉积参数进行了进一步详细研究,得到了最佳电化学沉积参数;最后,用分光光度计、扫描电子显微镜(SEM)和X-射线衍射仪(XRD)对薄膜的成分、形貌和结构进行分析和表征,表明该薄膜的化学计量比接近1:1。

Firstly, the feasibility, which ZnSe films were co-deposited in the ZnSO4 and Na2 SeO3 acidic solution by elec- trochemistry, was analyzed theoretically. Then, the ZnSe thin film series experiments were carried on in zinc sulfate and in the selenite sodium electrolyte solution in order to further study the effects thin film ingredient and appearance on elec- trochemical co-deposition the parameter, such as pH value, ratio of ion density, electric current density, complexing agent and temperature. The best electrochemical deposition parameter was obtained through the orthogonal testing. Final- ly, deposited ZnSe films were characterized by scanning electron microscope （SEM）, energy dispersion analysis of X-ray （EDAX） and X-beam diffraction meter （XRD）, and found the stoichiometric ratio of ZnSe films be close to 1 ：1.