摘要
通过改变SU-8光刻胶中PAG浓度获得含不同PAG浓度的各种改性SU-8光刻胶,在对其光学性能以及最小曝光剂量的测定基础上研究改性SU-8光刻胶的光刻工艺,借助于改性SU-8光刻胶的合理设计以及背面曝光和正面曝光的结合应用提高多元材料复杂结构的集成制造能力。
Kinds of diluted SU8 resists are obtained by adjusting its PAG concentration. On the base of the measurement of optical performance and the minimal exposure dose, we study its photolithography process. With the reasonable design of diluted SU8 resist and the adoption of front and back exposure, we can improve the ability of integrate manufacture with complex structure.
出处
《功能材料与器件学报》
CAS
CSCD
北大核心
2009年第3期259-263,共5页
Journal of Functional Materials and Devices
基金
国家重点实验室基金资助(No.914OC7903070608
9140C7903060706)
关键词
最小曝光剂量
PAG
集成制造
minimal exposure dose
PAG
integrated manufacture
