Ni微网格透明电极的制备及透光性能研究

Preparation of Ni Microgrid Transparent Electrode and Its Transmission Property

以聚苯乙烯胶体晶体为模板,采用磁控溅射方法制备了孔径分别为1.2,2.4,3.4,4.5和5.6μm的Ni微网格透明电极。利用扫描电子显微镜(SEM)、紫外可见分光光度计(UV-Vis)和四探针测试仪考察了微网格孔径对电极透过率及导电性能的影响。发现随网格孔径增大,电极透过率逐渐降低,导电性能逐渐增强。微网格透明电极在紫外与可见光区具备优良的透明导电性能。微网格结构的理论计算和原子力显微镜(AFM)分析结果表明,随着模板中PS球直径的增大,Ni在基底上覆盖厚度的线性增大,是导致微网格透明电极透光性能下降和导电性能增强的根本原因。

Ni microgrid transparent electrodes with different pore sizes （1.2, 2.4, 3.4, 4.5 and 5.6 μm）, were prepared via sputtering Ni into the gaps of PS colloidal crystal templates by magnetron sputtering. The influence of the pore sizes on the transmittance and the electric properties of the Ni microgrid transparent electrodes were investigated by SEM, UV-Vis spectrometer and four-point probe. It was found that the transmittance decreased and electric properties increased with the increase of the pore sizes of the samples. Ni microgrid transparent electrode showed a low electrical resistance and high transmittance in the ultraviolet-visible range. The results of theoretical calculation and AFM analysis indicated that the height of microgrid increased with the increase of the diameter of PS particles, which is the fundamental reason for the decrease of the transmission properties and the increase of electric properties of Ni microgrid transparent electrodes.