PYROSOL薄膜淀积技术

PYROSOL Apparatus and Coatings

介绍了一种新的膜淀积技术－ＰＹＲＯＳＯＬ技术的原理和方法，总结了一些化合物薄膜的制备条件。给出了Ｆｅ２Ｏ３、ＺｒＯ２薄膜生长的影响因素。还介绍了ＳｉＯ２膜的ＰＹＲＯＳＯＬ溶胶———凝胶制备方法。

The principle of a new film-forming method, PYROSOL technique, is described. The conditions for the preparation of some compounds are summarized. Combining with the preparation of a gas sensors, The factors of influence on the formation of Fe 2O 3 and ZrO 2 thin films are given. The sol-gel preparation of SiO 2 films by PYROSOL are also concerned.