毫米波椭偏测量法的数值模拟研究

Numerical Simulation of Ellipsometry Measurement at Millimeter Wavelengths

介绍了一种新型的毫米波椭偏法,可以用来测量介质材料的介电常数和厚度。通过分析入射波波长和入射角的不同取值对实验结果的影响,给出了入射波波长和入射角的取值范围,同时对介电常数、厚度与椭偏参数之间的关系进行了数值模拟研究。研究结果表明,由椭偏参数经数值计算反演出的介电常数、厚度通常会出现多值的情况。但对大多数的介质薄膜而言,却可以通过该方法求出唯一确定的介电常数与厚度,表明了毫米波椭偏法在介质参数测量上的可行性。

A novel ellipsometry technique for measuring the permittivity and thickness of dielectric materials at millimeter wavelengths is presented in this paper. The effects of wavelength and incident angle on experiment errors are analyzed. In addition, the relationship between ellipsometric parameters and dielectric parameters is investigated by numerical simulation. The results show that the same ellipsometric parameters may correspond to different permittivities or different thicknesses. However, for most dielectric films which are widely used, the permittivity and thickness can be determined uniquely. The feasibility of the ellipsometry for measuring dielectric parameter is verified.