摘要
对采用磁控溅射方法生长在玻璃和柔性聚对苯二甲酸乙二醇酯(PET)塑料上的氧化铟锡(ITO)薄膜的结构、光学和电学特性进行了对比研究。在两种不同的衬底上均得到了不分相的、高质量的多晶ITO薄膜,其中生长在玻璃衬底上的ITO薄膜(002)衍射峰的半峰宽为0.24°,生长在PET衬底上的为0.28°。两种样品在可见光区都具有很高的透过率,其中玻璃衬底上生长的薄膜的透过率约为92%,PET上生长的薄膜的透过率高达87%。两种薄膜均具有良好的导电性,玻璃衬底上薄膜的电阻率为4.2×10-4Ω.cm,柔性PET衬底上薄膜的电阻率为4.7×10-4Ω.cm。实验结果证明,完全可以采用磁控溅射的方法在柔性衬底上生长出高质量的ITO薄膜。
The structural, optical and electrical properties of indium-tin oxide (ITO) thin film grown on inflexible glass and flexible polyethylene terephthalate (PET) substrates by magnetron sputtering method were investigated. High quality polycrystalline ITO thin films without phase-segregation were obtained on both substrates. The FWHM of (002) diffraction peak is 0.24° and 0.28° for ITO thin film grown on glass and PET substrate, respectively. ITO thin films grown on different substrate both showed high transmittance ratio and high conductivity. The transmittance ratio is 92% and 87%, the conductivity is 4.2×10^-4Ω·cm and 4.7×10^-4 Ω·cm for the thin film grown on glass and PET substrate, respectively. It is believed that high quality ITO thin film can be grown on flexible substrate by magnetron sputtering method, and the quality of ITO grown on flexible substrate is comparable with that grown on inflexible substrate.
出处
《液晶与显示》
CAS
CSCD
北大核心
2009年第3期389-392,共4页
Chinese Journal of Liquid Crystals and Displays
基金
吉林省科技厅青年科研基金(No.20080170)
关键词
氧化铟锡
磁控溅射
X射线衍射
透光率
电阻率
indium-tin oxide
magnetron sputtering
x-ray diffraction
transmittance ratio
resistivity