双层硅外延片在大功率器件中的应用

A Use of the Doubledecker Extension Silicon inHigh Power Device

主要介绍了具有双层杂质浓度分布的硅外延片在改善或消除雪崩注入二次击穿、改善大电流特性以及改善高频特性等方面所起的重要作用，并介绍了具体工艺方法。

This paper briefly introduces the important function of the extension silicon with doubledecker impurity in improving(or eliminating)the second breakdown,enhancing the characteristics of the large current,and raising the hige frequency performance.And practical techniques are also given.