摘要
在微机上用分子动力学方法模拟了熔Si淬火制备a-Si的过程。硅原子间的相互作用势采用Stilinger-Weber势。受计算量的约束,淬火速度一般很高,此时采用这种势无法直接从熔Si得到a-Si。本文作者采用1000K左右的体积一次性膨胀法克服这一困难。对模拟制备的a-Si的径向偶对分布函数、键角分布函数及配位数的分析表明,a-Si中的四面体网络结构已得到了比较好的恢复。对制备过程的分析则显示,体积膨胀及随后的弛豫所导致的三体能大幅度下降是使体积一次性膨胀法有效的主要原因。
The preparation of amorphous silicon via quenching the melt has been simulated by molecular dynamics method on microcomputer.StillingerWeber potential has been employed to describe the interaction between silicon atoms.For a very high quench rate which is usually used in simulation due to the limitation of the amount of computer time,it is impossible to obtain amorphous silicon from the melt directly using this potential.In this work,the oneshot volume expansion near the temperature of 1 000 K is taken to solve this problem.The wellrecovered tetrahedral network is evident from the analysis of the radial pair distribution function,the bond angle distribution function and the coordination number of the soprepared amorphous silicon.The analysis of the preparation procedure shows that,the substantial decrease of the threebody energy caused by the volume expansion and the subsequent relaxation process is the main reason of the validity of the oneshot volume expansion method.
出处
《压电与声光》
CSCD
北大核心
1998年第4期267-271,共5页
Piezoelectrics & Acoustooptics
关键词
分子动力学模拟
非晶硅
淬火
半导体材料
molecular dynamics simulation,amorphous silicon(aSi),quenching,StillingerWeber potential