摘要
考虑了非晶效应和非晶无序弹性散射的影响,通过MonteCarlo方法模拟电子在薄膜电致发光器件(TFEL)的SiO2加速层的散射过程,从理论上描述了SiO2层的加速作用与电流倍增效应,获得了电子平均能量与场强的关系曲线、电离率、电流倍增因子。
he accelerating action and the current multiplication of SiO2 used in thin film electroluminescent device were studied theoretically using the Monte Carlo method to simulate the process of electron scattering in SiO2. The amorphous effect and the elastic scattering of disorder were considered. All the properties, such as the relation curve of the electron average energy and the electric field strength, ionization rate, current multiplication coefficient, coincided with the experimental data perfectly.
出处
《发光学报》
EI
CAS
CSCD
北大核心
1998年第2期129-134,共6页
Chinese Journal of Luminescence
基金
国家自然科学基金
关键词
薄膜
电致发光器件
电离率
电子辐运
二氧化硅
thin film electroluminescent device (TFEL), ionization rate, current multiplication coeffcient