紫外级氧化铪的生产工艺研究

Preparation of the UV Grade HfO_2

紫外级氧化铪具有优异的光学性能和抗激光损伤性能,是制备高功率激光薄膜、高折射率紫外薄膜以及其他光学薄膜的重要材料。锆铪分离是制备紫外级氧化铪的关键。本实验研究了N235-H2SO4萃取分离锆铪体系的影响因素,并得到用N235-H2SO4萃取分离体系制备低锆氧化铪的最佳工艺。经过4级萃取,制备出含锆量低于0.1%的紫外级氧化铪。

Owing to the excellent optical properties and laser damage resistance, the UV grade HfO2 became one of the most commonly used optical coating materials for optical components, laser-damage-resistant applications and high index UV coatings. The separation technique between Zr and Hf was the key of the UV grade HfO2 production. It was investigated that some factors about the N235-H2SO4 extraction system for separation hafnium and zirconium and established the best process used in the N235-H2SO4 extraction separation system to prepare HfO2 with trace ZrO2. After four stages extraction, HfO2 with lower than 0. 1% ZrO2 was prepared