磁控溅射法制备FeCu薄膜

Preparition of FeCu Thin Films by Magnetron Sputtering

采用直流磁控溅射在Si（001）基片上制备了FeCu纳米薄膜,薄膜样品分别经过300-600℃退火处理1 h.利用X射线衍射仪和振动样品磁强计对样品的结构和磁性进行了测量和分析.结果表明,沉积得到的亚稳态FeCu合金在300℃时发生相分离,随温度的升高,晶粒长大,相分离程度增强.在300-500℃范围内样品的矫顽力随温度的升高而变大,当退火温度为600℃时矫顽力变小.

FeCu thin films were prepared by magnetron sputtering on Si substrates and annealed in vacuum in the temperature range from 300 to 600 ℃. The structure and magnetic properties was analysed by XRD and VSM. The results showed that metastable FeCu alloys decomposed into fcc Cu and bcc Fe at 300 ℃. With the increasing of the annealing temperature, particels grew and phase sepreation improved. While the value of Hc increased with the increasing of the temperature at first, but it reduced when the temperature surpass 500 ℃.