用K4M低温包埋剂和紫外线低温包埋机联合的免疫电镜法

A immunoelectron microscopy method using K4 M hypothermy embedding medium and UV Cryo Chamber Operation Manual

目的研究低温包埋剂及其聚合的环境对免疫电镜技术的重复性和稳定性的意义。方法利用低温包埋剂Lowicryls K4M和紫外线低温包埋机(SPI#17020)处理免疫电镜组织标本。结果观察到组织的超微结构和抗原性保存完好。结论低温包埋剂Lowicryls K4M和紫外线低温包埋机的结合使用能较好地应用在免疫电镜技术中。

Objective To research hypothermy embedding medium and its polymerization circumstance is meaningful for the reproducibility and stability of immunoelectron microscopy technology. Methods When the tissue for immunoelectron microscopy was dealed by hypothermy embedding medium （ Lowicryls K4M） and ultraviolet hypothermy embedding machine （ SPI# 17020 ）. Results The uhramicrostructure and antigenicity of tissue conserved well. Conclusion The combination of hypothermy embedding medium （Lowicryls K4M） and ultraviolet hypothermy embedding machine can be applied well.